Piper Jaffray Remains Bullish on Lam Research (LRCX) Following Investor Meetings
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Lam Research Ships 200th Kiyo(R) Conductor Etch Module With Proprietary Hydra(R) Technology
July 13, 2015 4:07 PM EDTFREMONT, CA -- (Marketwired) -- 07/13/15 -- Lam Research Corp. (NASDAQ: LRCX), a major global supplier of innovative wafer fabrication equipment and services to the semiconductor industry, today announced it has shipped its 200th Kiyo® conductor etch module with proprietary Hydra® technology. By enabling multiple patterning inflections at advanced nodes, the product is rapidly gaining momentum with customers across industry segments. In memory, the installed base is growing as a result of implementation for advanced DRAM, planar NAND, and 3D NAND with shipments doubling in the past quarter. In logic, the product is positioned at all... More
Lam Research Releases High-Productivity VECTOR(R) ALD Oxide Deposition System
July 13, 2015 4:06 PM EDTFREMONT, CA -- (Marketwired) -- 07/13/15 -- Lam Research Corp. (NASDAQ: LRCX), a major global supplier of innovative wafer fabrication equipment and services to the semiconductor industry, today announced it has released its high-productivity VECTOR® ALD Oxide system on the Extreme platform. The new product uses atomic layer deposition (ALD) to create highly conformal dielectric films with an emphasis on advanced patterning, in particular spacer-based multiple patterning. One key challenge is managing thickness variability of the self-aligned spacers that define critical dimensions (CDs). By delivering superior CD control, VECTOR ALD Oxide has been winning volume-production decisions for... More
Lam Research Launches Flex(TM) G Series for High-Aspect-Ratio Dielectric Etch
July 13, 2015 4:05 PM EDTFREMONT, CA -- (Marketwired) -- 07/13/15 -- Lam Research Corp. (NASDAQ: LRCX), a major global supplier of innovative wafer fabrication equipment and services to the semiconductor industry, today announced it has introduced the Flex G Series for high-aspect-ratio (HAR) dielectric etch to enable the continued scaling of DRAM and 3D NAND devices. The HAR capacitor cells and vertical transistor channels within these devices require the formation of distortion-free vertical profiles from the top to the bottom of these tall, narrow features. Built upon Lam's Flex product family, the market leader in dielectric etch for memory,... More
