Applied Materials' (AMAT) New eBeam Metrology System Paves the Way to High-NA EUV Lithography

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Go back to Applied Materials' (AMAT) New eBeam Metrology System Paves the Way to High-NA EUV Lithography

Applied Materials’ New eBeam Metrology System Paves the Way to High-NA EUV Lithography

February 28, 2023 7:36 AM EST

New VeritySEM® 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing

SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of semiconductor device features patterned with EUV and emerging High-NA EUV lithography.

Chipmakers use CD-SEMs (critical dimension scanning electron microscopes) to take sub-nanometer measurements of patterns once a lithography scanner transfers them from a mask to a photoresist. These measurements continuously calibrate... More