Molecular Vista Announces Vista 300

SAN JOSE, Calif.--(BUSINESS WIRE)-- Molecular Vista Inc. (MVI), a company specializing in nano-chemical metrology, is pleased to announce Vista 300 – a nano IR instrument targeted for advanced semiconductor process monitoring and defect analysis.

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Vista 300. A photo of the complete instrument along with a close-up. Vista 300 can accommodate wafers up to 300 mm. (Graphic: Business Wire)

Vista 300 combines an atomic force microscope with infrared spectroscopy to provide Photo-induced Force Microscopy (PiFM), a technique that performs chemical mapping with a spatial resolution of

A remarkable demonstration of PiFM is shown in the accompanying images – PiFM is able to map the chemical differences between exposed and unexposed 16 nm half-pitch patterns in EUV resist before the resist is developed. AFM topography reveals no hint of the exposed pattern, but PiFM detects the chemical changes caused by EUV exposure. For more information on this relatively new analytical technique, visit molecularvista.com.

Vista 300 is designed to handle full 300 mm wafers but does so in a minimal footprint of only 1.1 x 1.1 m2. The tool is fully developed and ready for immediate orders. Demonstrations of Vista 300 on customer wafers or other sample are available by contacting MVI through the company website.

In 2015, MVI was the first company to demonstrate AutoPiFM capability identifies materials and generates chemical maps and chemical fingerprint spectra with minimal user input required. Sit back and let AutoPiFM do the work! Likewise, MVI’s new AutoAlign system automatically and optimally focuses the IR optical beam on the AFM tip, eliminating the need for the user to learn the details of optical alignment. These features make PiFM fully accessible to laboratory or production technicians.

“With more advanced semiconductor processes dependent on atomically thin organic and dielectric layers with increasingly smaller feature sizes,” said Dr. Sung Park, CEO of Molecular Vista, “Vista 300 is a perfect hybrid topography and chemical metrology tool for characterizing High NA EUV lithography, selective atomic layer deposition, Cu-Cu hybrid bonding processes, and sub-100 nm defects.”

View source version on businesswire.com: https://www.businesswire.com/news/home/20240724467807/en/

Molecular Vista
(408) 915-2595
[email protected]

Source: Molecular Vista Inc.

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