Entegris Inc. (NASDAQ: ENTG) and JSR Corporation announced a non-exclusive cross-licensing agreement for extreme ultraviolet lithography technology used in semiconductor manufacturing.

The agreement allows both companies to cross-license metal oxide resist patents and terminates current Inter Partes Review challenges. The companies will also explore collaborative opportunities on future photoresist materials.

The collaboration spans resist formulation, precursor synthesis and development, and ultra-clean metal oxide resist-specific filtration with associated delivery systems for EUV lithography applications in high-volume manufacturing.

"As the industry moves to smaller nodes, materials innovation, performance, purity, and reliability become inseparable," said Olivier Blachier, senior vice president and chief strategy and innovation officer at Entegris.

JSR's subsidiary Inpria Corporation, acquired in 2021, specializes in EUV metal oxide resists. The partnership combines JSR and Inpria's metal oxide resist materials expertise with Entegris' capabilities in metal oxide resist precursors for CVD deposition, materials handling, and advanced filtration.

"Pairing Inpria's metal oxide resist innovation with Entegris' purification and materials handling capabilities broadens the applicability of these technologies within the semiconductor materials ecosystem," said Toru Kimura, senior officer at JSR Corporation.

Entegris supplies advanced materials and process solutions for the semiconductor industry and has approximately 7,700 employees globally. JSR Corporation is a materials technology company whose electronic materials business provides semiconductor materials including photoresists, process materials, packaging materials, and precursors.