Bruker Corporation (NASDAQ: BRKR) announced a joint development project with imec to expand the use of photothermal AFM-IR spectroscopy for semiconductor research applications. The collaboration involves installing Bruker's Dimension IconIR system at imec's facilities to evaluate nanoscale chemical characterization capabilities.

The project focuses on addressing research challenges in semiconductor device development as architectures continue to shrink. The technology will be applied to EUV photoresist patterning, advanced materials for transistor scaling, and site-selective surface functionalization for sensing and functional device applications.

"Metrology requirements for advanced semiconductor research are evolving rapidly, and together with Bruker we will assess how nanoIR technology can help address emerging requirements in nanoscale materials characterization," said Albert Minj, senior researcher at imec and project lead.

The Dimension IconIR system combines nanoscale infrared spectroscopy with scanning probe microscopy, providing sub-5-nanometer resolution for chemical analysis. The system supports samples up to 150 mm and integrates Bruker's photothermal AFM-IR modes for characterizing semiconductor materials and structures.

David V. Rossi, President of Bruker's Nano Surfaces and Metrology Division, stated that the collaboration allows expansion of photothermal AFM-IR capabilities in semiconductor research environments by investigating complex material systems and interfaces.

Bruker describes itself as the largest supplier of nanoscale infrared spectroscopy technology to the semiconductor industry. The company's IconIR technology has been validated through hundreds of peer-reviewed publications and provides correlation to FTIR techniques.